Research

announcement: 2009 RCIQE International Seminar

2009 RCIQE International Seminar on "Advanced Semiconductor Materials and Devices"

March 2-3, 2009
Conference Hall, Hokkaido University

Map of Hokkaido University and RCIQE
Program (download PDF version)

Monday, March 2
10:00 - 10:10 "Opening Address"
  - Semiconductor Nanowires -
10:10 - 10:50 "Vapor-liquid-solid growth of III-V nanowires: Mechanisms, difficulties, challenges"
J.-C. Harmand, F. Glas, G. Patriarche, L. Largeau, M. Tchernycheva, C. Sartel and L. Liu,
CNRS-LPN, France
10:50 - 11:30 "Heterostructured wurtzite/zinc-blende GaAs/GaAsSb nanowires: New possibilities for band-structure engineering in nanowire based photonic devices"
H. Weman, Norwegian University of Science and Technology, Norway
11:30 - 11:50 "III-V semiconductor nanowires and their device application"
T. Fukui, Hokkaido University
11:50 - 13:20 Lunch Break
  - Spintronics -
13:20 - 14:00 "Characterization of spintronic materials - Are ferromagnetic clusters in semiconductors useful for spintronics?"
P. J. Klar, Justus-Liebig-University of Giessen, Germany
14:00 - 14:20 "Ferromagnetic MnAs nanoclusters position- controlled by selective-area MOVPE toward magneto-resistive device applications"
S. Hara, Hokkaido University and JST-PRESTO
14:20 - 14:40 Coffee Break
  - Graphen -
14:40 - 15:20 "Novel microscopies for graphene on SiC"
M. Nagase, H. Hibino, H. Kageshima, H. Yamaguchi, NTT Basic Research Labs.
15:20 - 15:40 "Theoretical investigation of graphene-channel field-effect transistors"
E. Sano, Hokkaido University
15:40 - 16:00 "Fabrication and characterization of graphene transistor on SiC"
K. Yoh and K. Konishi, Hokkaido University
16:00 - 17:30 Poster Viewing Session
Lab Tour to RCIQE (17:00 - 18:00)
18:00 - 19:30 Reception (Centennial Hall, Hokkaido Univ.)

 

Tuesday, March 3
  - Advanced Device Technology -
10:00 - 10:40 "InGaAs MISFET with hetero-laucher"
Y. Miyamoto, Tokyo Institute of Technology
10:40 - 11:20 "Cooperation of R&D's on compound semiconductor materials with advanced electron devices in NTT laboratories"
N. Shigekawa, M. Hiroki and H. Sugiyama, NTT Photonics Labs.
11:20 - 11:40 "Electrochemical formation and sensor application of InP porous nanostructures"
T. Sato, Hokkaido University
11:40 - 13:10 Lunch Break
  - Nanoelectronic Materials and Devices -
13:10 - 13:50 "Novel-functional single-electron device using nanodot array with multiple outputs"
Y. Takahashi1, T. Kaizawa1, M. Arita1, A. Fujiwara2, Y. Ono2 and H. Inokawa3,
1Hokkaido University, 2NTT Basic Research Labs., 3Shizuoka University
13:50 - 14:30 "Siliconphotonics and plasmonics for on-chip interconnection"
K. Ohashi, NEC and MIRAI-Selete
14:30 - 14:50 "Semiconductor surfaces and growth of nanowires: A first-principles study"
H. Koga, Hokkaido University
14:50 - 15:00 "Closing Remarks"

 

correspondence:

Taketomo Sato, RCIQE, Hokkaido University
TEL: 011-706-7175, FAX: 011-716-6004
e-mail: taketomo@rciqe.REMOVEME.hokudai.ac.jp
(remove REMOVEME from the address)
http://www.rciqe.hokudai.ac.jp/conferences/seminar2009.html

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