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$@!!!!!=(J Fabrication
and Characterization of Quantum Nanostructures$@!=(J
$@!!!!!=(J Qubit
(Quantum Bit)$@!=(J
$@!!!!!=(J (Quantum)
Observation of Quantum States $@!=(J
We investigate
the new device technology which enables quantum information
handling by quantum mechanical switching of electronic
devices, such as quantum dot(QD) transistors (Related
Papers #1). A quantum dot FET structure, consisting
of HEMT and self-assembled quantum dots, can be grown
by Molecular Beam Epitaxy (MBE). Electronic states in
a QD can be controlled by terminal voltage of the transistor
(Fig.1a,b). It can be applied to spin FETs which detect
spin states in the QDs , if combined with spin injection
technology. (Topics-$@#2(J) We are trying to build a semiconductor
qubit structure based on these method.
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$@!c(JRelated
Papers (Published)$@!!(J
1. Kanji Yoh
and Hironobu Kazama, and Yoshito Katano "A Quantum
Dot FET$@!=(JA Future Playground of Quantum State Manipulation
- ," 59th Device Research Conference, Conference Digest
pp.93-94 (2001).
IEEE Catalog Number:01TH8561 ISBN:0-7803-7014-7 Library
of Congress:01-087536
2. Kanji Yoh
and Hironobu Kazama, "Conductance Spectroscopy of InAs
Quantum dots Buried in GaAs," Physica E, 7, pp.440-443
(2000).
3. Kanji Yoh and Sanshiro Shiina, "Crossover from Coulomb
blockade to single electron memory mode in a d-dopedchannel
GaAs split-gate transistor embedded with InAs dots in adjacent
to the channel," The Physics of Semiconductors (World
Scientific 1999).
$@!c(JRelated
Project
JST(Japan Science
and Technology Corporation,$@!!(JCREST
(Core Research for Evolutional Science and Technology) "
Development
of Elemental Technology for Quantum Information Processing,"
Principal
Investigator$@!!(JProfessor
Shunichi Mutoh
$@!c(JRelated
Research in Other Groups
$@!!(JQuantum
Zeno Effect$@!J(JWaseda
University, Ohba/Nakazato Lab$@!K!!(J
$@!!(JTarucha
ERATO Project (University
of Tokyo, Professor TaruchaÕs group)$@!!(J
$@!!(JList
of Research Groups Working on Non-equilibrium Systems
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$@!!!!!](JControl
of ferromagnetic metal/semiconductor interface$@!](J
$@!!!!!](JPolarization
measurement of electroluminescence by spin injection
$@!](J
$@!!!!!](JSpin-injection
transistors$@!]!!(J
We
are investigating spin transport, especially spin injection
into semiconductors as well as spin transport in semiconductors.
Our goal is to control spins electrically and eventually
achieve the spin transistor operation. One of the challenging
topics is the Òspin injectionÓ into semiconductors.
We are pursuing the spin injection at ferromagnetic
metal and semiconductor junctions in collaboration with
Nanoelectronics group at our university (Prof.Mukasa),
and Professor PloogÕs group (PDI in Berlin) Fig.2. Crystal
growth (Fe on InAs for example) and injection measurement
technology are the major key factors to achieve correct
evaluation of spin injection. We have obtained satisfactory
results so far. By combining this resul, we are hoping
to achieve semiconductor based quantum computers. We
are also pursuing spin-orbit interaction in 2DEG in
narrow-gap semiconductors, and tunneling spectroscopy
spin-dependent density of states at the surface inversion
layer. |
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$@!c(JRelated
Papers (Published)
1. Hiroshi Ohno, Kanji Yoh, Toshihiro Doi, Agus Spagyo,
Kazuhisa Sueoka, and Koichi Mukasa, "Spin injection
with Fe/InAs hybrid structures,
" Int.Phys.Conf.Ser.,
No.170, Chapter 3, (2002) pp.275-280
2. Hiroshi
Ohno, Kanji Yoh, Toshihiro Doi, Agus Spagyo, Kazuhisa
Sueoka, and Koichi Mukasa, "Growth and Characterization
of Fe(100)/InAs(100) hybrid structures," J.Vac.Sci.
Technol.B.vol.19, Number 6, (2001) pp. 2280- 2283.
$@!c(JRelated
Projects
JST(Japan
Science and Technology Corporation,$@!!(JCREST
(Core Research for Evolutional Science and Technology)
"
Development
of Elemental Technology for Quantum Information Processing,"
Principal Investigator" Professor Shunichi
Mutoh |
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$@!!!=(J Ultra
High Speed, Ultra Low Power Device$@!=(J
$@!!!=(J Integration
of Resonant Tunnel Diode with Advanced CMOS Technology$@!=(J
$@!!!=(J Gigabit
Technology based on Quantum Dot Unit Cell$@!=(J
We investigate
the giga-bit scale integration, ultra-high speed, low-power
technology by pursuing conceptually new approaches.
These attempts include new logic operation embedding
non-linear device elements such as RTD or delay element
into advanced CMOS technology. Ultimate goal is to turn
the array of quantum dots into an array of logic gates
by adding memory and logic function to each dot by one
way or another. Anyhow, concept of non-linear systems
and non-equilibrium systems are anticipated to play
an important role. |
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$@!c(JRelated
Papers
Following
are some of our early attempts for high speed, low
power, new functional devices.
#1 deals with high performance MOSFET by introducing
bipolar action in MOSFETs achieving 3 - 4 times enhancement
in gm.
#2 reports high performance HEMTs in pure InAs channel
FET structures.
#3 reports first attempt to combine FET with RTD and
integrate them monolithically achieving new functional
operation with high noise margin.
#4 reports the lowest speed¥power product in semiconductors
(in 1887) by monolithically integrating high performance
strained InGaAs HEMTs and double heterojunction p-HEMTs.
1. Kanji Yoh, Ryouji Koizumi, Naotaka Hashimoto and
Shuji Ikeda, "A High Performance p-Channel Transistor:b-MOSFET,"
Jpn.J.Appl.Phys, Vol.35, pp.906-909 (1996)
2. K.Yoh,
T.Moriuchi and M.Inoue, "An InAs Channel Heterojunction
Field-Effect Transistor with High Transconductance,"
IEEE Electron Device Lett., EDL-11(11), pp593-598
(1990)
3. K.Lear, K.Yoh, J.S.Harris Jr, "Monolithic
Integration of GaAs/AlGaAs Resonant Tunnel Diode Load
and GaAs Enhancement MESFET Drivers for Tunnel Diode
FET Gate Logic," Inst. Phys. Conf. Ser., 106,
pp593-598 (1989)
4. Kanji Yoh, J. S. Harris Jr.,"Complementary
MODFET Circuits Consisting of Pseudomorphic NMODFET
and Double Heterojunction PMODFET by Selective Molecular
Beam Epitaxy," Presented at International Electron
Device Meeting, (Washington D.C., U.S.A) (1987) Published
in the Technical Digest of IEEE International Electron
Devices Meeting (IEDM), pp892-894 (1987)
$@!c(JRelated
Project
$@!!(J- Joint
project$@!J(JHitachi
Ltd.$@!K(J
$@!c(JRelated
Research$@!J(JOther groups$@!K(J
$@!!(J- Non-linear
phenomena$@!J(JHokkaido
University, Profesor AkeraÕs Lab,$@!K(J
$@!!(J- Non-linear
Phenomena and ReactionDiffusion SystemsApplied to
Electronic Circuits
$@!J(JHokkaido
University, Professor AmemiyaÕs Lab$@!K(J
$@!!(J-
Research groups working on non-equilibrium systems
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$@!!!!!=(JMolecular
Beam Epitaxy$@!=(J
$@!!!!!=(J Quantum
Dots, Quantum Wires$@!=(J
$@!!!!!=(J Fabrication
and Characterization of Quantum Nanostructures$@!=(J
We investigate
the fabrication technology of quantum nanostructures
such as quantum dots, quantum wires, and hybrid structures
with dissimilar materials using combined technology
of nano lithography and Molecular Beam Epitaxy (MBE).
A hybrid structure includes heteroepitaxy of ferromagnetic
metals on semiconductors. The quantum nanostructures
are sought to fabricate a new type of device to deal
with quantum information processing
Fig.3 shows an example of arrayed InAs quantum dots
on patterned substrate and Fig.4 shows an example of
quantum wire by selective-doping mechanism. |
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$@!c(JRelated
Papers (Published)
1. Y.Katano,
T.Doi, H.Ohno, and K.Yoh, "Surface potential analysis
on doping superlattice by electrostatic force microscope,"
Appl.Surf.Sci., 188 (2002) pp.399-402
2. Kanji Yoh and Shingo Takabayashi, "Fabrication
of GaAs quantum wires by natural selsective selective
doping and its characterization by electrostatic force
microscope," J.Vac.Sci.Technol.B 18 (3), pp.1675-1679
(2000)
3. Kanji Yoh, Toshiya Saitoh, Arata Tanimura and Ryuusuke
Nakasaki,"Self-assembled InAs dots and quantum
wires fabricated on patterned (311)A GaAs substrates
by molecular beam epitaxy," J. Electronic Materials,
vol.28,No.5, pp.457-465 (1999).
4. S.Takabayashi, H.Kazama, Y.Kitasho and K. Yoh, "Structural
and transport characterization of AlGaAs/GaAs quantum
wires formed by selective doping mechanism," Inst.
Phys. Conf. Ser. No.162, pp.391-396 (1999).
5. Kanji Yoh and Sanshiro Shiina, "Crossover from
Coulomb blockade to single electron memory mode in a
d-dopedchannel GaAs split-gate transistor embedded with
InAs dots in adjacent to the channel," The Physics
of Semiconductors (World Scientific 1999).
6. Kanji Yoh, Ryuusuke Nakasaki and Shingo Takabayashi,
" Self-assembled InAs dots and quantum wires fabricated
on patterned (311)A GaAs substrates by molecular beam
epitaxy," J.Crystal Growth 201/202, pp.1164-1167
(1999). |
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